Atomic layer deposition of calcium oxide and calcium hafnium oxide films using calcium cyclopentadienyl precursor

Thin Solid Films

Volumn 500, Issue 1-2, 2006, Pages 322-329

  Kukli, Kaupo ^a,c   Ritala, Mikko ^a   Sajavaara, Timo ^b,d   Hänninen, Timo ^a   Leskelä, Markku ^a  

^a UNIVERSITY OF HELSINKI   (Finland)

^b KU LEUVEN   (Belgium)

^c UNIVERSITY OF TARTU   (Estonia)

^d UNIVERSITY OF JYVÄSKYLÄ   (Finland)

Author keywords

Deposition process; Dielectric properties; Oxides; Structural properties

Indexed keywords

DEPOSITION; DIELECTRIC FILMS; FILM GROWTH; HAFNIUM COMPOUNDS; HYDROGEN; LIME; MIXTURES; PERMITTIVITY; REFRACTIVE INDEX; X RAY DIFFRACTION ANALYSIS;

DEPOSITION PROCESSES; SILICON SUBSTRATES;

THIN FILMS;

EID: 31644432060     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.10.082     Document Type: Article

References (51)

1. N.H. de Leeuw, and J.A. Burton Phys. Rev., B 63 2001 195417
2. D. Kulkarni, and I.E. Wachs Appl. Catal., A 237 2002 121
3. R.I. Merino, J.A. Pardo, J.I. Peña, G.F. de la Fuente, A. Larrea, and V.M. Orera Phys. Rev., B 56 1997 10907
4. L.-G. Hwa, C.-C. Chen, and S.-L. Hwang Chin. J. Phys. 35 1997 78
5. L. Promsong, and M. Sriyudthsak Sens. Actuators, B, Chem. 25 1995 504
6. M. Boulouz, L. Martin, A. Boulouz, and A. Boyer Mater. Sci. Eng., B, Solid-State Mater. Adv. Technol. 67 1999 122
7. C.E. Curtis, L.M. Doney, and J.R. Johnson J. Am. Ceram. Soc 37 1954 358
8. H. Doweidar J. Non-Cryst. Solids 277 2000 98
9. T. Vanderah, W. Febo, J.Y. Chan, R.S. Roth, L.M. Loezos, L.D. Rotter, R.G. Geyer, and D.B. Minor J. Solid-State Chem. 155 2000 78
10. H. Nörenberg, and J.H. Harding Phys. Rev., B 59 1999 9842
11. A.V. Vaysleyb Phys. Rev., B 58 1998 8407
12. R.A. Rao, Q. Gan, C.B. Eom, R.J. Cava, Y. Suzuki, J.J. Krajewski, S.C. Gausepohl, and M. Lee Appl. Phys. Lett. 70 1997 3035
13. V. Dimitrov, and S. Sakka J. Appl. Phys. 79 1996 1741
14. P.S. Shashidhara, A. Weyl, and D. Janke Solid State Ionics 69 1994 93
15. A. Mitsui, M. Miyayama, and H. Yanagida Solid State Ionics 22 1987 213
16. Y.W. Kwon, D.P. Norton, and G.E. Jellison Jr. Solid-State Electron. 47 2003 2149
17. K. Shibyua, T. Ohnishi, M. Lippmaa, M. Kawasaki, and H. Koinuma Appl. Phys. Lett. 85 2004 425
18. K. Shibyua, T. Ohnishi, M. Kawasaki, H. Koinuma, and M. Lippmaa Solid-State Electron. 47 2003 2211
19. K. Shibyua, T. Ohnishi, M. Lippmaa, M. Kawasaki, and H. Koinuma Appl. Phys. Lett. 84 2004 2142
20. S.C. Ke Phys. Rev., B 62 2000 4194
21. S. Kambe, K. Sato, K. Suezawa, S. Kasuga, S. Ohshima, and K. Okuyama Mater. Chem. Phys. 54 1998 190
22. O. Nilsen, H. Fjellvåg, and A. Kjekshus Thin Solid Films 450 2004 240
23. A. Rahtu, T. Hänninen, and M. Ritala J. Phys., IV France 11 2001 Pr-3923
24. T. Hatanpää, T. Hänninen, J. Ihanus, J. Kansikas, I. Mutikainen, M. Vehkamäki, M. Ritala, and M. Leskelä Electrochem. Soc. Proc. 2003-08 2003 516
25. M. Vehkamäki, T. Hatanpää, T. Hänninen, M. Ritala, and M. Leskelä Electrochem. Solid-State Lett. 2 1999 504
26. J. Niinistö, M. Putkonen, L. Niinistö, S.L. Stoll, K. Kukli, T. Sajavaara, M. Ritala, and M. Leskelä Chem. Mater. 15 2005 2271
27. T. Suntola Thin Solid Films 216 1992 84
28. D.J. Burkey, R.A. Williams, and T.P. Hanusa Organometallics 12 1993 1331
29. T.P. Hanusa Chem. Rev. 93 1993 1023
30. K. Kukli, J. Aarik, M. Ritala, T. Uustare, T. Sajavaara, J. Lu, J. Sundqvist, A. Aidla, L. Pung, A. Hårsta, and M. Leskelä J. Appl. Phys. 96 2004 5298
31. M. Ylilammi, and T. Ranta-aho Thin Solid Films 232 1993 56
32. V. Dimitrov, and S. Sakka J. Appl. Phys. 79 1996 1736
33. M. Ritala, M. Leskelä, L. Niinistö, T. Prohaska, G. Friedbacher, and M. Grasserbauer Thin Solid Films 250 1994 72
34. J. Aarik, A. Aidla, A.-A. Kiisler, T. Uustare, and V. Sammelselg Thin Solid Films 340 1999 110
35. K. Kukli, M. Ritala, T. Sajavaara, J. Keinonen, and M. Leskelä Thin Solid Films 416 2002 72
36. Joint Committee of Powder Diffraction Data, Card 04-0733.
37. Joint Committee of Powder Diffraction Data, Card 04-777.
38. C. Delamarre, and M.P. y Jorba Rev. Hautes Temp. Refract. 2 1965 313
39. S.L. Sorokina, and J. Ya. Scolis Bol. Soc. Esp. Ceram. Vidr. 31 1992 227
40. G.B. Senft, and V.S. Stubican Mater. Res. Bull. 18 1983 1163
41. N.A. Godina, and E.K. Keler Ogneupory 26 1961 426
42. D.S. Rutman, G.A. Taksis, and Y. S. Toropov Izv. Akad. Nauk SSSR, Neorg. Mater. 4 1968 2220
43. Joint Committee of Powder Diffraction Data, Card 026-0997.
44. Joint Committee of Powder Diffraction Data, Card 036-0524.
45. Joint Committee of Powder Diffraction Data, Card 036-1473.
46. K. Kukli, M. Ritala, J. Lu, A. Hårsta, and M. Leskelä J. Electrochem. Soc 151 2004 F189
47. K. Kukli, M. Ritala, M. Leskelä, T. Sajavaara, J. Keinonen, D.C. Gilmer, and P.J. Tobin Mater. Sci. Eng., B, Solid-State Mater. Adv. Technol. 109 2004 2
48. K. Kukli, M. Ritala, M. Leskelä, T. Sajavaara, J. Keinonen, D.C. Gilmer, R. Hegde, R. Rai, and L. Prabhu J. Mater. Sci., Mater. Electron. 14 2003 361
49. D.K. Schröder Semiconductor Material and Device Characterization 2nd ed. 1998 J. Wiley and Sons, Inc. New York 362
50. T. Hori Gate Dielectrics and MOS ULSIs, Principles, Technologies and Applications 1997 Springer-Verlag Berlin 40
51. S. Ferrari, and G. Scarel J. Appl. Phys 96 2004 144