Atomic vapor deposition of strontium tantalate films for MIM applications

IEEE Transactions on Electron Devices

Volumn 55, Issue 8, 2008, Pages 2273-2277

  Lukosius, Mindaugas ^a   Wenger, Christian ^a   Pasko, Sergej ^b   Costina, Ioan ^a   Dabrowski, Jarek ^a   Sorge, Roland ^a   Müssig, Hans Joachim ^a   Lohe, Christoph ^b  

^a INNOVATIONS FOR HIGH PERFORMANCE MICROELECTRONICS   (Germany)

^b AIXTRON AG   (Germany)

Author keywords

Atomic vapor deposition (AVD); Metal insulator metal (MIM); Sr Ta O; Strontium; Tantalates

Indexed keywords

ALKALINE EARTH METALS; LITHIUM COMPOUNDS; METAL INSULATOR BOUNDARIES; METALS; MIM DEVICES; NONMETALS; SILICON; SILICON CARBIDE; STRONTIUM; TANTALUM; THICK FILMS;

ATOMIC VAPOR DEPOSITION; ATOMIC VAPOR DEPOSITION (AVD); HIGH-K DIELECTRICS; METAL-INSULATOR-METAL; METAL-INSULATOR-METAL (MIM); SILICON CARBIDE DEVICES; SR - TA- O; TANTALATES; THIN FILMS;

VAPOR DEPOSITION;

EID: 49249118796     PISSN: 00189383     EISSN: None     Source Type: Journal    
DOI: 10.1109/TED.2008.925286     Document Type: Article

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