Atomic layer deposition growth of BaB2O4 thin films from an exceptionally thermally stable tris(pyrazolyl)borate-based precursor

Chemistry of Materials

Volumn 21, Issue 16, 2009, Pages 3742-3744

  Saly, Mark J ^a   Munnik, Frans ^b   Baird, Ronald J ^a   Winter, Charles H ^a  

^a WAYNE STATE UNIVERSITY   (United States)

^b INSTITUTE OF ION BEAM PHYSICS AND MATERIALS RESEARCH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

AS-DEPOSITED FILMS; DEPOSITION CYCLES; FREE FILMS; GROWTH BEHAVIOR; PULSE LENGTH; SEM; SEM MICROGRAPHS; SUBSTRATE TEMPERATURE; THERMALLY STABLE; TRISPYRAZOLYLBORATE; WATER PULSE;

ATOMIC FORCE MICROSCOPY; ATOMIC LAYER DEPOSITION; ATOMS; BARIUM; SCANNING ELECTRON MICROSCOPY;

RESERVOIRS (WATER);

EID: 69249192601     PISSN: 08974756     EISSN: None     Source Type: Journal    
DOI: 10.1021/cm902030d     Document Type: Article

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