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Journal of Applied Physics

Volumn 107, Issue 9, 2010, Pages

Effect of resonance in external radio-frequency circuit on very high frequency plasma discharge

(3) Rauf, Shahid a Chen, Zhigang a Collins, Ken a

a APPLIED MATERIALS INC (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BOTTOM ELECTRODES; CAPACITIVELY COUPLED PLASMA DISCHARGES; CHAMBER WALLS; DIELECTRIC RINGS; DISTRIBUTED CIRCUITS; ELECTRICAL LENGTH; ELECTROMAGNETIC PLASMAS; ELECTRON DENSITIES; OUTER PERIPHERY; PLASMA CHAMBERS; RADIO FREQUENCIES; RADIO FREQUENCY CIRCUIT; RETURN CURRENT; RF CURRENTS; RF SOURCES; TRANSMISSION LINE; VERY HIGH FREQUENCY PLASMA;

BANDPASS FILTERS; CARRIER CONCENTRATION; COUPLED CIRCUITS; DENSITY FUNCTIONAL THEORY; ELECTRIC LINES; ELECTROMAGNETIC WAVES; ELECTROMAGNETISM; ELECTRON DENSITY MEASUREMENT; PLASMAS; TRANSMISSION LINE THEORY; WALLS (STRUCTURAL PARTITIONS);

ELECTRIC DISCHARGES;

EID: 77958189652 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.3406153 Document Type: Article

Times cited : (35)

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