A technique for uniform generation of very-high-frequency plasma suited to large-area thin-film deposition

Applied Physics Letters

Volumn 88, Issue 8, 2006, Pages

  Yamakoshi, H ^a   Satake, K ^a   Takeuchi, Y ^a   Mashima, H ^a   Aoi, T ^a  

^a MITSUBISHI HEAVY INDUSTRIES LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

MULTIPLE FEEDING POINTS; PHASE DIFFERENCE; PLASMA EMISSIONS; VERY HIGH FREQUENCY PLASMAS;

DEPOSITION; ELECTRODES; NITROGEN; PLASMAS; SUBSTRATES; THIN FILMS; VOLTAGE DISTRIBUTION MEASUREMENT;

PLASMA THEORY;

EID: 33644506457     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2176867     Document Type: Article

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