Mechanics analysis of femtosecond laser-Induced blisters produced In thermally grown oxide on Si(100)

Journal of Materials Research

Volumn 25, Issue 6, 2010, Pages 1087-1095

  McDonalda, Joel P ^a   Tnorilessb, M D ^b   Yalisove, Steven M ^a  

^a UNIVERSITY OF MICHIGAN   (United States)

^b University of Michigan   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BLISTER FORMATION; FEMTO-SECOND LASER; FEMTOSECONDS; INTRINSIC RESIDUAL STRESS; LASER INDUCED; MECHANICS ANALYSIS; PULSED LASER; PULSED LASER IRRADIATION; RESIDUAL FILM STRESS; SI(1 0 0); SILICON DIOXIDE; SILICON SUBSTRATES; THERMALLY GROWN OXIDE; WAFER CURVATURE TECHNIQUE;

MECHANICS; PULSED LASER APPLICATIONS; SILICA; SILICON WAFERS;

PULSED LASERS;

EID: 77958141146     PISSN: 08842914     EISSN: None     Source Type: Journal    
DOI: 10.1557/jmr.2010.0146     Document Type: Article

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