Femtosecond laser irradiation stress induced in pure silica

Optics Express

Volumn 11, Issue 9, 2003, Pages 1070-1079

  Poumellec, B ^a   Sudrie, L ^b   Franco, M ^b   Prade, B ^b   Mysyrowicz, A ^b  

^a UNIVERSITÉ PARIS SUD   (France)

^b LABORATOIRE D OPTIQUE APPLIQUÉE   (France)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS MATERIALS; GLASS; MICROSCOPES; POLARIZATION; SHEAR STRESS; SILICA; STRESS ANALYSIS;

FEMTOSECOND LASER IRRADIATION; GLASS RELAXATION; LASER-INDUCED CHEMISTRY; WRITING BEAMS;

LASER BEAM EFFECTS;

EID: 2942674137     PISSN: 10944087     EISSN: None     Source Type: Journal    
DOI: 10.1364/OE.11.001070     Document Type: Article

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