Experimental investigation of ablation efficiency and plasma expansion during femtosecond and nanosecond laser ablation of silicon

Applied Physics A: Materials Science and Processing

Volumn 80, Issue 2, 2005, Pages 237-241

  Zeng, X ^a   Mao, X L ^a   Greif, R ^a   Russo, R E ^a  

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

IMAGING TECHNIQUES; LASER PULSES; PLASMAS; SAPPHIRE; SILICON; SPECTROSCOPIC ANALYSIS; TITANIUM;

FEMTOSECOND LASERS; PLASMA EXPANSION; PULSE DURATION; PULSE NUMBER;

LASER ABLATION;

EID: 10844278394     PISSN: 09478396     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00339-004-2963-9     Document Type: Article

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