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Volumn 35, Issue 16, 2000, Pages 4193-4199
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Microstructure and secular instability of the (Ti1-x,Alx)N films prepared by ion-beam-assisted-deposition
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Author keywords
[No Author keywords available]
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Indexed keywords
CRYSTAL STRUCTURE;
ELECTRON DIFFRACTION;
ENERGY DISPERSIVE SPECTROSCOPY;
FILM PREPARATION;
ION BOMBARDMENT;
PHASE SEPARATION;
SILICON WAFERS;
SOLUBILITY;
TITANIUM COMPOUNDS;
TRANSMISSION ELECTRON MICROSCOPY;
VAPOR DEPOSITION;
X RAY CRYSTALLOGRAPHY;
ION BEAM ASSISTED DEPOSITION;
SELECTED AREA ELECTRON DIFFRACTION;
THICK FILMS;
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EID: 0034250038
PISSN: 00222461
EISSN: None
Source Type: Journal
DOI: 10.1023/A:1004835111782 Document Type: Article |
Times cited : (53)
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References (26)
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