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Volumn 35, Issue 16, 2000, Pages 4193-4199

Microstructure and secular instability of the (Ti1-x,Alx)N films prepared by ion-beam-assisted-deposition

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL STRUCTURE; ELECTRON DIFFRACTION; ENERGY DISPERSIVE SPECTROSCOPY; FILM PREPARATION; ION BOMBARDMENT; PHASE SEPARATION; SILICON WAFERS; SOLUBILITY; TITANIUM COMPOUNDS; TRANSMISSION ELECTRON MICROSCOPY; VAPOR DEPOSITION; X RAY CRYSTALLOGRAPHY;

EID: 0034250038     PISSN: 00222461     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1004835111782     Document Type: Article
Times cited : (53)

References (26)
  • 18
    • 33847558371 scopus 로고
    • Idem., Intermetallics 2 (1994) 55.
    • (1994) Intermetallics , vol.2 , pp. 55
  • 19
    • 33847534095 scopus 로고
    • Idem., Mater. Sci. and Eng. A179/180 (1994) 238.
    • (1994) Mater. Sci. and Eng. , vol.180 A179 , pp. 238


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.