Examination of the pulsing phenomena in pulsed-closed field unbalanced magnetron sputtering (P-CFUBMS) of Cr-Al-N thin films

Surface and Coatings Technology

Volumn 201, Issue 8, 2007, Pages 4640-4652

  Lin, J ^a   Moore, J J ^a   Mishra, B ^a   Sproul, W D ^b   Rees, J A ^c  

^a Department of Geology and Geological Engineering   (United States)

^b Reactive Sputtering Consulting LLC   (United States)

^c HIDEN ANALYTICAL LTD   (United Kingdom)

Author keywords

Chromium aluminum nitride (CrAlN); Closed field unbalanced magnetron sputtering (CFUBMS); Electrostatic quadrupole plasma mass spectrometer (EQP); Ion energy distributions (IED); Ion flux; Pulsed power

Indexed keywords

CHROMIUM ALLOYS; ELECTRIC POTENTIAL; MASS SPECTROMETRY; THIN FILMS;

CHROMIUM ALUMINUM NITRIDE; CLOSED FIELD UNBALANCED MAGNETRON SPUTTERING; ELECTROSTATIC QUADRUPOLE PLASMA MASS SPECTROMETER; ION ENERGY DISTRIBUTIONS; ION FLUX; PULSED POWER;

MAGNETRON SPUTTERING;

CHROMIUM ALLOYS; ELECTRIC POTENTIAL; MAGNETRON SPUTTERING; MASS SPECTROMETRY; THIN FILMS;

EID: 33845300154     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2006.10.010     Document Type: Article

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