Influence of total gas pressure on the microstructure and properties of CrAlN films deposited by a pulsed DC balanced magnetron sputtering system

Journal of Alloys and Compounds

Volumn 503, Issue 2, 2010, Pages 389-391

  Khamseh, S ^a   Nose, M ^a   Kawabata, T ^a   Matsuda, K ^a   Ikeno, S ^a  

^a UNIVERSITY OF TOYAMA   (Japan)

Author keywords

CrAlN film; Pulse width; Pulsed DC magnetron sputtering; Total sputtering pressure

Indexed keywords

MAGNETRON SPUTTERING; REACTIVE SPUTTERING; SPUTTERING; ZINC SULFIDE;

CRALN FILMS; MAGNETRON SPUTTERING SYSTEMS; MICROSTRUCTURE AND PROPERTIES; PULSED DC MAGNETRON SPUTTERING; PULSEWIDTHS; SPUTTERING PRESSURES; STRUCTURE AND PROPERTIES; TOTAL GAS PRESSURE;

FILM PREPARATION;

EID: 77956660482     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jallcom.2010.04.145     Document Type: Article

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