High-density MIM capacitors with porous anodic alumina dielectric

IEEE Transactions on Electron Devices

Volumn 57, Issue 10, 2010, Pages 2679-2683

  Hourdakis, E ^a   Nassiopoulou, A G ^a  

^a INSTITUTE OF MICROELECTRONICS   (Greece)

Author keywords

Capacitor; high ; metalinsulatormetal (MIM); porous anodic alumina; radio frequency (RF)

Indexed keywords

AL FILMS; ALUMINUM OXIDES; CAPACITANCE DENSITY; ELECTRICAL CHARACTERIZATION; HIGH-DENSITY; LOW-LEAKAGE CURRENT; METALINSULATORMETAL (MIM); MIM CAPACITORS; POROUS ANODIC ALUMINA; RADIO FREQUENCY (RF); TEMPERATURE CHANGES; TEMPERATURE STABILITY; THERMAL STABILITY;

ALUMINUM; ALUMINUM COATINGS; ALUMINUM SHEET; CAPACITORS; METALLIC FILMS; RADIO; RADIO WAVES; THERMODYNAMIC STABILITY;

MIM DEVICES;

EID: 77957011795     PISSN: 00189383     EISSN: None     Source Type: Journal    
DOI: 10.1109/TED.2010.2058350     Document Type: Article

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