Electric-field-driven dielectric breakdown of metal-insulator-metal hafnium silicate

Applied Physics Letters

Volumn 91, Issue 24, 2007, Pages

  Lee, Byoung Hun ^a   Kang, Chang Yong ^a   Kirsch, Paul ^a   Heh, Dawei ^a   Young, Chadwin D ^a   Park, Hongbae ^a   Yang, Jiwoon ^a   Bersuker, Gennadi ^a   Krishnan, Siddarth ^b   Choi, Rino ^c   Lee, Hi Deok ^d  

^a SEMATECH   (United States)

^b IBM   (United States)

^c Inha University   (South Korea)

^d Chungnam National University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

CAPACITORS; CRYSTALLIZATION; DIELECTRIC MATERIALS; ELECTRIC BREAKDOWN; ELECTRIC FIELD EFFECTS; HAFNIUM COMPOUNDS;

CHARGE TO BREAKDOWN (QBD); HAFNIUM SILICATE;

MIM DEVICES;

EID: 37149029682     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2825288     Document Type: Article

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