Structural, optical, and morphological properties of laser ablated ZnO doped Ta2O5 films

Materials Science and Engineering: B

Volumn 174, Issue 1-3, 2010, Pages 150-158

  Krishnan, Renju R ^a   Vinodkumar, R ^a   Rajan, Geo ^a   Gopchandran, K G ^a   Mahadevan Pillai, V P ^a  

^a UNIVERSITY OF KERALA   (India)

Author keywords

High k films; Micro Raman spectra; Nanorings; Nanostructured tantalum oxide thin films; Pulsed laser deposition

Indexed keywords

AMORPHOUS FILMS; ANNEALING; ATOMIC FORCE MICROSCOPY; ENERGY GAP; FOURIER TRANSFORM INFRARED SPECTROSCOPY; II-VI SEMICONDUCTORS; LATTICE CONSTANTS; NANOSTRUCTURED MATERIALS; OPTICAL FILMS; OXIDE FILMS; PARTICLE SIZE; PULSED LASER DEPOSITION; PULSED LASERS; REFRACTIVE INDEX; SEMICONDUCTOR DOPING; TANTALUM OXIDES; ULTRAVIOLET VISIBLE SPECTROSCOPY; X RAY DIFFRACTION;

ATOMIC-FORCE-MICROSCOPY; CRISTALLINITY; DOPED FILMS; HIGH- K; HIGH-K FILM; MICRO-RAMAN SPECTRUM; NANO-STRUCTURED; NANOSTRUCTURED TANTALUM OXIDE THIN FILM; PULSED-LASER DEPOSITION; THIN-FILMS;

THIN FILMS;

EID: 77956482193     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mseb.2010.03.065     Document Type: Conference Paper

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