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Volumn 388, Issue 1-2, 2001, Pages 283-289

Optical properties of amorphous and polycrystalline tantalum oxide thin films measured by spectroscopic ellipsometry from 0.03 to 8.5 eV

(5) Franke, E a,b Schubert, M a Trimble, C L a DeVries, M J a Woollam, J A a

a UNIVERSITY OF NEBRASKA LINCOLN (United States)

b LEIBNIZ INSTITUTE OF SURFACE ENGINEERING IOM (Germany)

Author keywords

Amorphization; Crystallization; Infrared spectroscopy; Optical properties; Tantalum

Indexed keywords

AMORPHIZATION; AMORPHOUS FILMS; ANNEALING; CRYSTALLIZATION; ELLIPSOMETRY; LIGHT ABSORPTION; MAGNETRON SPUTTERING; OPTICAL PROPERTIES; OXYGEN; PARTIAL PRESSURE; POLYCRYSTALLINE MATERIALS; PRESSURE EFFECTS; SILICON; SPUTTER DEPOSITION; TANTALUM COMPOUNDS; THIN FILMS;

TANTALUM OXIDE;

OPTICAL FILMS;

EID: 0035372145 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/S0040-6090(00)01881-2 Document Type: Article

Times cited : (31)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.