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Volumn 10, Issue 1, 1999, Pages 9-31

Preparation and properties of tantalum pentoxide (Ta2O5) thin films for ultra large scale integrated circuits (ULSIs) application - a review

Author keywords

[No Author keywords available]

Indexed keywords

DYNAMIC RANDOM ACCESS STORAGE; ELECTRIC CONDUCTIVITY OF SOLIDS; OXIDES; TANTALUM COMPOUNDS; ULSI CIRCUITS;

EID: 0032636629     PISSN: 09574522     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1008970922635     Document Type: Article
Times cited : (169)

References (151)
  • 14
    • 0345199040 scopus 로고    scopus 로고
    • PhD Thesis, National Chiao Tung University, Hsinchu, Taiwan
    • T. F. CHEN, PhD Thesis, National Chiao Tung University, Hsinchu, Taiwan, (1997).
    • (1997)
    • Chen, T.F.1
  • 17
    • 0344336477 scopus 로고
    • in VLSI Technology edited by S. M. Sze, Ch. 3, McGraw-Hill, New York
    • A. C. ADAMS, "Dielectric and Polysilicon Film Deposition", in VLSI Technology edited by S. M. Sze, Ch. 3, McGraw-Hill, New York, 1993 p. 93.
    • (1993) Dielectric and Polysilicon Film Deposition , pp. 93
    • Adams, A.C.1
  • 28
    • 0003494870 scopus 로고
    • edited by J. L. Vossen and W. Kern, Academic Press, New York
    • W. KERN and V. S. BAN, "Thin Film Processes", edited by J. L. Vossen and W. Kern, (Academic Press, New York, 1978).
    • (1978) Thin Film Processes
    • Kern, W.1    Ban, V.S.2
  • 104
    • 0003520079 scopus 로고
    • Plenum Press, New York
    • 2 Interface" (Plenum Press, New York, 1988) p. 129.
    • (1988) 2 Interface , pp. 129
    • Sayyah, K.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.