Pulsed laser deposition of tantalum oxide thin films

Applied Surface Science

Volumn 108, Issue 3, 1997, Pages 399-403

  Zhou, Mingfei ^a   Fu, Zhengwen ^a   Yang, Haijun ^a   Zhang, Zhuangjian ^a   Qin, Qizong ^a  

^a FUDAN UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; ANNEALING; CHEMICAL VAPOR DEPOSITION; PERMITTIVITY; PHASE TRANSITIONS; POLYCRYSTALLINE MATERIALS; PULSED LASER APPLICATIONS; REFRACTIVE INDEX; SEMICONDUCTING SILICON; TANTALUM COMPOUNDS; X RAY DIFFRACTION ANALYSIS;

PULSED LASER DEPOSITION; TANTALUM OXIDE;

THIN FILMS;

EID: 0031103686     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0169-4332(96)00605-8     Document Type: Article

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