Microstructural, optical and spectroscopic studies of laser ablated nanostructured tantalum oxide thin films

Applied Surface Science

Volumn 255, Issue 16, 2009, Pages 7126-7135

  Krishnan, Renju R ^a   Gopchandran, K G ^a   MahadevanPillai, V P ^a   Ganesan, V ^b   Sathe, Vasant ^b  

^a UNIVERSITY OF KERALA   (India)

^b UGC DAE CONSORTIUM FOR SCIENTIFIC RESEARCH   (India)

Author keywords

Atomic force microscopy; FTIR studies; Nanostructures; Pulsed laser ablation; Raman spectra; Tantalum oxide thin films; UV visible spectra; X ray diffraction

Indexed keywords

AMORPHOUS FILMS; ANNEALING; ATOMIC FORCE MICROSCOPY; CRYSTAL ORIENTATION; ENERGY GAP; FILM GROWTH; FOURIER TRANSFORM INFRARED SPECTROSCOPY; LASER ABLATION; NANOSTRUCTURES; OXIDE FILMS; PULSED LASER DEPOSITION; PULSED LASERS; RAMAN SCATTERING; SPECTROSCOPIC ANALYSIS; TANTALUM OXIDES; ULTRAVIOLET VISIBLE SPECTROSCOPY; X RAY DIFFRACTION;

FT-IR STUDY; GRAZING-INCIDENCE X-RAY DIFFRACTION; MICRO RAMAN MEASUREMENTS; MICRO RAMAN SPECTROSCOPY; OXIDE THIN FILMS; PULSED-LASER DEPOSITION TECHNIQUE; UV VISIBLE SPECTROSCOPY; UV-VISIBLE SPECTRA;

THIN FILMS;

EID: 65549153319     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2009.03.059     Document Type: Article

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