Investigation of damage mechanisms in PMMA during ToF-SIMS depth profiling with 5 and 8 keV SF5 + primary ions

Journal of Physical Chemistry C

Volumn 114, Issue 34, 2010, Pages 14510-14519

  Mahoney, Christine M ^a   Kushmerick, James G ^a   Steffens, Kristen L ^a  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AFM; ANALYTICAL TOOL; BEAM ENERGIES; BULK SAMPLES; CLUSTER SIMS; CROSS-LINKED POLYMERS; CROSSLINKED STRUCTURES; DAMAGE ACCUMULATION; DAMAGE MECHANISM; DEPTH PROFILE; EROSION DEPTH; FILM DEPTH; GEL EFFECT; GEL POINT; ION BEAM ENERGY; MOLECULAR FILMS; POLYATOMICS; PRIMARY IONS; SPUTTER RATE; STRUCTURAL DAMAGES; TOF SIMS; XPS ANALYSIS; XPS SPECTRA;

ATOMIC FORCE MICROSCOPY; ATOMIC SPECTROSCOPY; CHEMICAL ANALYSIS; CROSSLINKING; EROSION; ESTERS; GELS; ION BEAMS; ION SOURCES; IONS; SECONDARY ION MASS SPECTROMETRY; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

DEPTH PROFILING;

EID: 77956143613     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp103938y     Document Type: Article

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