Uniformity in patterns imprinted using photo-curable liquid polymer

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 41, Issue 6 B, 2002, Pages 4173-4177

  Hiroshima, Hiroshi ^a   Inoue, Seiji ^b   Kasahara, Nobuyuki ^b   Taniguchi, Jun ^b   Miyamoto, Iwao ^b   Komuro, Masanori ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^b TOKYO UNIVERSITY OF SCIENCE   (Japan)

Author keywords

Granulation; Imprint lithography; Nanoimprint; Pattern replication; Photo curable liquid polymer; Photo induced solidification; Reactive ion etching

Indexed keywords

COMPUTER SIMULATION; DEGRADATION; GRANULATION; LIQUIDS; NANOTECHNOLOGY; PHOTOSENSITIVITY; POLYMERS; REACTIVE ION ETCHING; SOLIDIFICATION;

IMPRINT LITHOGRAPHY;

LITHOGRAPHY;

EID: 0036614064     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.41.4173     Document Type: Article

References (10)