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Volumn 42, Issue 6 B, 2003, Pages 3849-3853

Elimination of pattern defects of nanoimprint under atmospheric conditions

Author keywords

Bubble defects; Condensation; Imprint lithography; Liquid polymer; Nanoimprint; Photo induced solidification; Trichlorofluoromethane

Indexed keywords

ATMOSPHERIC PRESSURE; CONDENSATION; DEFECTS; GAS DYNAMICS; PATTERN RECOGNITION; POLYMERS; SOLIDIFICATION;

BUBBLE DEFECTS;

PHOTOLITHOGRAPHY;

EID: 0042864419 PISSN: 00214922 EISSN: None Source Type: Journal
DOI: 10.1143/jjap.42.3849 Document Type: Conference Paper

Times cited : (53)

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