SCOPUS 정보 검색 플랫폼

Volumn 45, Issue 6 B, 2006, Pages 5602-5606

Photo-nanoimprinting using sample-on-flexible-thruster stage

Author keywords

Compliant contact mechanism; Imprint lithography; Nanoimprint; Photo nanoimprint; SOFT stage; Step and repeat; UV nanoimprint; Wafer warping

Indexed keywords

LIGHTING; RESINS; ULTRAVIOLET RADIATION;

COMPLIANT CONTACT MECHANISM; IMPRINT LITHOGRAPHY; NANOIMPRINT; PHOTONANOIMPRINT; SOFT STAGE; STEP-AND-REPEAT; UV NANOIMPRINT; WAFER WARPING;

NANOTECHNOLOGY;

EID: 33745646306 PISSN: 00214922 EISSN: 13474065 Source Type: Journal
DOI: 10.1143/JJAP.45.5602 Document Type: Review

Times cited : (33)

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