HIPIMS: The new PVD technology

Vakuum in Forschung und Praxis

Volumn 20, Issue SUPPL. 1, 2008, Pages 27-32

  Munz W D ^a  

^a Technologies GmbH and Co KG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CHROMIUM COMPOUNDS; COATINGS; MAGNETRON SPUTTERING; METAL IONS; METALS;

CATHODIC ARC DISCHARGES; DISCHARGE CONDITIONS; HIGH POWER IMPULSE MAGNETRON SPUTTERING (HIPIMS); HIGH PULSE POWER DENSITY; HOMOGENOUS COATINGS; METAL ION CONCENTRATION; MULTIPLE IONIZATION; SPUTTERING TECHNOLOGY;

NITROGEN COMPOUNDS;

EID: 54949089065     PISSN: 0947076X     EISSN: None     Source Type: Journal    
DOI: 10.1002/vipr.200890036     Document Type: Article

References (8)

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5. A. P. A. Hurkmans, PhD Thesis, Sheffield Hallam University (SHU), (2002)
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8. Patent Sheffield Hallam University, EP 1260603. US 2005/0109607