Adhesion improvement of plasma-deposited silica thin films on stainless steel substrate studied by x-ray photoemission spectroscopy and in situ infrared ellipsometry

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 16, Issue 1, 1998, Pages 6-12

  Bertrand, N ^a   Drevillon B ^a   Gheorghiu, A ^b   Senemaud C ^b   Martinu, L ^c   Klemberg Sapieha, J E ^c  

^a LABORATOIRE DE PHYSIQUE DES INTERFACES ET DES COUCHES MINCES   (France)

^b Laboratoire de Chimie Physique   (France)

^c ÉCOLE POLYTECHNIQUE DE MONTRÉAL   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0032326574     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.581013     Document Type: Article

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