Chromium oxide-based multilayer coatings deposited by reactive magnetron sputtering in an industrial setup

Surface and Coatings Technology

Volumn 203, Issue 1-2, 2008, Pages 156-159

  Eklund, P ^a   Mikkelsen, N J ^b   Sillassen, M ^a   Bienk, E J ^b   Bottiger J ^a  

^a AARHUS UNIVERSITY   (Denmark)

^b CemeCon Scandinavia A/S   (Denmark)

Author keywords

Chromium oxide; Multilayer; Reactive sputtering; Rutherford backscattering spectroscopy; Scanning electron microscopy (SEM); X ray diffraction (XRD)

Indexed keywords

CHROMIUM; MAGNETRON SPUTTERING; NANOCRYSTALS; REACTIVE SPUTTERING; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SPUTTERING; X RAY DIFFRACTION;

ALTERNATING LAYERS; CHROMIUM OXIDES; CYCLIC VARIATIONS; MULTI-LAYER-COATING; NANOCRYSTALLINES; REACTIVE MAGNETRON SPUTTERING; SIMPLE METHOD; SUBSTRATE ROTATION;

MULTILAYERS;

EID: 77649187458     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2008.08.035     Document Type: Article

References (29)

1. A.S. Kao, M.F. Doerner, V.J. Novotny, J. Appl. Phys. 66 (1989) 5315.
2. S. Sahoo, C.H. Binek, Phil. Mag. Lett. 87 (2007) 259.
3. A.L. Ji, W. Wang, G.H. Song, Q.M. Wang, C. Sun, L.S. Wen, Mater. Lett. 58 (2004) 1993.
4. P. Jin, G. Xu, M. Tazawa, K. Yoshimura, D. Music, J. Alami, U. Helmersson, J. Vac. Sci. Technol. A 20 (2002) 2134.
5. J.M. Andersson, Zs. Czigány, P. Jin, U. Helmersson, J. Vac. Sci. Technol. A 22 (2004) 117.
6. P. Eklund, M. Sridharan, M. Sillassen, J. Bottiger, Thin Solid Films 516 (2008) 7447.
7. M. Witthaut, R. Cremer, K. Reichert, D. Neuschütz, Mikrochim. Acta 133 (2000) 191.
8. J. Ramm, M. Ante, T. Bachmann, B. Widrig, H. Brändle, M. Döbeli, Surf. Coat. Technol. 202 (2007) 876.
9. J. Ramm, M. Ante, H. Brändle, A. Neels, A. Dommann, M. Döbeli, Adv. Eng. Mater. 9 (2007) 604.
10. P. Hones, M. Diserens, F. Lévy, Surf. Coat. Technol. 120-121 (1999) 277.
11. G. Contoux, F. Cosset, A. Célérier, J. Machet, Thin Solid Films 292 (1997) 75.
12. X. Pang, K. Gao, A.A. Volinsky, J. Mater. Res. 22 (2007) 3531.
13. M. Audronis, A. Matthews, A. Leyland, J. Phys. D: Appl. Phys. 41 (2008) 035309.
14. U. Helmersson, S. Todorova, S.A. Barnett, J.-E. Sundgren, L.C. Markert, J.E. Greene, J. Appl. Phys. 62 (1987) 481.
15. M. Shinn, L. Hultman, S.A. Barnett, J. Mater. Res 7 (1992) 901.
16. G. Abadias, A. Michel, C. Tromas, C. Jaouen, S.N. Dub, Surf. Coat. Technol 202 (2007) 844.
17. P.H. Mayrhofer, C. Mitterer, L. Hultman, H. Clemens, Prog. Mater. Sci. 51 (2006) 1032.
18. G. Abadias, Surf. Coat. Technol. 202 (2008) 2223.
19. P. Eklund, H. Högberg, L. Hultman, Phys. Status Solidi RRL 1 (2007) 113.
20. O. Wilhelmsson, P. Eklund, F. Giuliani, H. Högberg, L. Hultman, U. Jansson, Appl. Phys. Lett. 91 (2007) 123124.
21. K. An, K.S. Ravichandran, R.E. Dutton, S.L. Semiatin, J. Am. Ceram. Soc. 82 (1999) 399.
22. P.C. Yashar, S.A. Barnett, L. Hultman, W.D. Sproul, J. Mater. Res. 14 (1999) 3614.
23. S. Zhang, H.L. Wand, S.-E. Ong, D. Sun, X.L. Bui, Plasma Processes and Polymers 4 (2007) 219.
24. M. Mayer, Nucl. Instr. Meth. B 194 (2002) 177.
25. K.N. Andersen, E.J. Bienk, K.O. Schweitz, H. Reitz, J. Chevallier, P. Kringhøj, J. Bøttiger, Surf. Coat. Technol. 123 (2000) 219.
26. M. Panjan, S. Sturm, P. Panjan, M. Cekada, Surf. Coat. Technol. 202 (2007) 815.
27. M. Panjan, M. Cekada, P. Panjan, T. Peterman, Plasma Processes and Polymers 4 (2007) S921.
28. P.J. Kelly, R. Hall, J. O, Brien, J.W. Bradley, G. Roche, R.D. Arnell, Surf. Coat. Technol. 142-144 (2001) 635.
29. E. Barnat, T.M. Lu, J. Vac. Sci. Technol A 17 (1999) 3322.