Reducing the impurity incorporation from residual gas by ion bombardment during high vacuum magnetron sputtering

Applied Physics Letters

Volumn 88, Issue 19, 2006, Pages

  Rosán, Johanna ^a   Widenkvist, Erika ^b   Larsson, Karin ^b   Kreissig, Ulrich ^c   Mráz, Stanislav ^a   Martinez, Carlos ^a   Music, Denis ^a   Schneider, J M ^a  

^a RWTH AACHEN UNIVERSITY   (Germany)

^b UPPSALA UNIVERSITY   (Sweden)

^c INSTITUTE OF ION BEAM PHYSICS AND MATERIALS RESEARCH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; MAGNETRON SPUTTERING; THIN FILMS; VACUUM APPLICATIONS; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

ELASTIC RECOIL DETECTION ANALYSIS; ION ENERGY; REACTIVE MAGNETRON SPUTTERING; SURFACE DIFFUSION;

ION BOMBARDMENT;

EID: 33646705615     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2193044     Document Type: Article

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