Deposition process study of chromium oxide thin films obtained by d.c. Magnetron sputtering

Thin Solid Films

Volumn 292, Issue 1-2, 1997, Pages 75-84

  Contoux, G ^a   Cosset, F ^a   Celerier A ^a   Machet, J ^a  

^a CNRS   (France)

Author keywords

Deposition process; Oxides; Physical vapour deposition; Sputtering

Indexed keywords

ATOMS; CALCULATIONS; CHROMIUM COMPOUNDS; COATINGS; CRYSTALLIZATION; DEPOSITION; HYSTERESIS; MAGNETRON SPUTTERING; OXYGEN; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

CHROMIUM OXIDE; HYSTERESIS LOOP; PHYSICAL VAPOUR DEPOSITION;

THIN FILMS;

EID: 0031553494     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(96)08941-9     Document Type: Article

References (6)

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4. Handbook of X-Ray PhotoElectron Spectroscopy, Perkin-Elmer Corporation, Physical Electronics Division, Oct 1992, pp. 44-45, 76-77.
5. H.H. Andersen and H.L. Bay, in R. Behrisch (ed.), Sputtering by Particle Bombardment I, Springer-Verlag, Berlin, 1981, pp. 145-218.
6. K. Ellmer, in G. Hecht, F. Richter and J. Hahn (eds.), 4th Int. Symp. on Trends and New Applications in Thin Films - TATF'94 Dresden, Germany, Proceedings in Thin Films, DGM Informationsgesellschaft, Oberursel, 1994, pp. 131-134.