Low-temperature α-alumina thin film growth: Ab initio studies of Al adatom surface migration

Journal of Physics D: Applied Physics

Volumn 42, Issue 12, 2009, Pages

  Wallin, E ^a   Munger E P ^a   Chirita, V ^a   Helmersson, U ^a  

^a LINKÖPING UNIVERSITY   (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

AB INITIO STUDY; ALUMINA DEPOSITION; ALUMINA THIN FILMS; EXPERIMENTAL STUDIES; FIRST-PRINCIPLES DENSITY FUNCTIONAL THEORY; LOW TEMPERATURES; METASTABLE POSITIONS; MODERATE TEMPERATURE; NOVEL PROCESS; NUDGED ELASTIC BAND METHODS; SURFACE DIFFUSIVITY; SURFACE HOPPING; SURFACE MIGRATION;

ACTIVATION ENERGY; ALUMINA; ALUMINUM; DENSITY FUNCTIONAL THEORY; ENERGY BARRIERS; OPTICAL FILMS; SULFUR COMPOUNDS; SURFACE DIFFUSION; THIN FILM DEVICES; THIN FILMS;

FILM GROWTH;

EID: 70249105054     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/42/12/125302     Document Type: Article

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