Low temperature deposition of α-Al2O3 thin films by sputtering using a Cr2O3 template

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 20, Issue 6, 2002, Pages 2134-2136

  Jin, P ^a   Xu, G ^a   Tazawa, M ^a   Yoshimura, K ^a   Music, D ^b   Alami, J ^b   Helmersson, U ^b  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^b LINKÖPING UNIVERSITY   (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; CRYSTALLINE MATERIALS; LOW TEMPERATURE OPERATIONS; MOLECULAR BEAM EPITAXY; SPUTTER DEPOSITION; X RAY DIFFRACTION;

NANOINDENTATION;

THIN FILMS;

EID: 0036863563     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1513641     Document Type: Article

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