Surface characterization and properties of silicon nitride films prepared by ion-assisted deposition

Surface and Coatings Technology

Volumn 204, Issue 20, 2010, Pages 3234-3237

  Ku, Shih Liang ^a   Lee, Cheng Chung ^a  

^a NATIONAL CENTRAL UNIVERSITY   (Taiwan)

Author keywords

Composition; IAD; Infrared optical constants; Mechanical property; Silicon nitride; Surface morphology

Indexed keywords

COMPOSITION; EXTINCTION COEFFICIENTS; FOURIER TRANSFORM INFRARED SPECTROMETRY; HYDROGEN CONTENTS; IAD; INFRARED OPTICAL CONSTANTS; INFRARED OPTICAL PROPERTIES; ION CURRENT DENSITY; ION-ASSISTED DEPOSITION; LOW SUBSTRATE TEMPERATURE; NANOINDENTERS; SILICON NITRIDE FILM; SMOOTH SURFACE; SURFACE CHARACTERIZATION;

ATOMIC FORCE MICROSCOPY; FILM PREPARATION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; ION BEAM ASSISTED DEPOSITION; IONS; MECHANICAL PROPERTIES; MOLECULAR BEAM EPITAXY; MORPHOLOGY; OPTICAL CONSTANTS; OPTICAL PROPERTIES; SILICON NITRIDE; THIN FILMS; X RAY DIFFRACTION;

SURFACE MORPHOLOGY;

EID: 77953024134     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2010.03.022     Document Type: Article

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