Infrared ellipsometric characterization of silicon nitride films on textured Si photovoltaic cells

Materials Research Society Symposium Proceedings

Volumn 1123, Issue , 2009, Pages 145-150

  Saenger, M F ^a   Schadel M ^c   Hofmann, T ^a   Hilfiker, J ^b   Sun, J ^b   Tiwald, T ^b   Schubert, M ^a   Woollam, J A ^a,b  

^a UNIVERSITY OF NEBRASKA LINCOLN   (United States)

^b J A WOOLLAM CO INC   (United States)

^c Q Cells AG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL COMPOSITIONS; DIELECTRIC FUNCTIONS; INFRARED SPECTROSCOPIC ELLIPSOMETRY; SAMPLE DATA; SILICON NITRIDE FILM; TEXTURED SI; THICKNESS PARAMETERS;

INDUSTRIAL RESEARCH; MORPHOLOGY; PHOTOELECTROCHEMICAL CELLS; PHOTOVOLTAIC CELLS; SILICON; SILICON NITRIDE; SPECTROSCOPIC ELLIPSOMETRY;

SUBSTRATES;

EID: 74549171545     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

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