Effect of deposition temperature on the chemical properties of thermally deposited silicon nitride films

Optical Materials

Volumn 27, Issue 4, 2005, Pages 663-670

  Patil, L S ^a   Pandey, R K ^a   Bange, Jaspal P ^a   Gaikwad, S A ^a   Gautam, D K ^a  

^a NORTH MAHARASHTRA UNIVERSITY   (India)

Author keywords

Chemical bonds; Chemical properties; Dielectric Films; DMDS; Ellipsometer and FTIR; Silicon nitride; Thermal CVD

Indexed keywords

AMMONIA; CHEMICAL VAPOR DEPOSITION; DEPOSITION; DIELECTRIC FILMS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HYDROGEN BONDS; NITROGEN; SPECTROSCOPY; THERMAL EFFECTS; VLSI CIRCUITS;

CHEMICAL PROPERTIES; DIMETHYL DICHLORO SILANE (DMDS); ELLIPSOMETER AND FTIR; THERMAL-CVD;

SILICON NITRIDE;

EID: 11244353457     PISSN: 09253467     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.optmat.2004.09.004     Document Type: Article

References (44)

1. F.H.P.M. Habraken, A.E.T. Kuiper, A.V. Oostrom, Y. Tamminga, and J.B. Theeten J. Appl. Phys. 53 1 1982 404
2. A.J. Lowe, M.J. Powell, and S.R. Elliot J. Appl. Phys. 59 4 1986 1251
3. W.A.P. Claassen, W.G.J.N. Valkenburg, M.F.C. Willemsen, and W.M.V.D. Wijgert J. Electrochem. Soc.: Solid State Sci. Technol. 132 1985 893
4. B. Reynes, and J.C. Bruyere Sensors Actuat. A 329 1992 303
5. F. Sandoval-Ibarra, J.E. Steve, and G.E. Ominguez Instrum. Develop. 4 3 2000 3
6. Y. Nakada, I. Aksenov, and H. Okumura Appl. Phys. Lett. 73 1998 827
7. T. Yasuda, S. Yamasaki, and S. Gwo Appl. Phys. Lett. 77 2000 3917
8. T. Yasuda, D.S. Huang, J.W. Park, K. Ikuta, S. Yamasaki, and K. Tanak Appl. Phys. Lett. 74 1999 653
9. J.Y.M. Lee, K. Sooriakumar, and M.M. Dang Thin Solid Films 203 1991 275
10. A. Piccirillo, and A.L. Gobbi J. Electrochem. Soc. 137 1990 3910
11. F. Bruno, M.D. Guidice, R. Recca, and F. Testa Appl. Opt. 30 1991 4560
12. J.M. Gonzalvez, R.G. Luna, M. Tundance, O. Sanchez, J.M. Albella, and J.M.M. Duart Thin Solid Films 220 1992 311
13. W.A. Lanford, and M.J. Rand J. Appl. Phys. 49 4 1978 2473
14. P. Temple-Boyer, C. Rossi, E. Saint-Etienn, and E. Scheid J. Vac. Sci. Technol. A 16 4 1998 2003
15. D.L. Smith, A.S. Alimonda, C.C. Chen, S.E. Ready, and B. Wacker J. Electrochem. Soc. 137 2 1990 614
16. R.E. Rocheleau, and Zhe. Zhang Thin Solid Films 220 1992 73
17. M. Molinari, H. Rinnert, and M. Vergnat Appl. Phys. Lett. 79 2001 2172
18. H. Dun, P. Pan, F.R. White, and R.W. Douse J. Electrochem. Soc.; Solid State Sci. Technol. 128 7 1982 1554
19. A.G. Noskov, G.A. Sokolova, E.M. Trukhanov, and S.I. Stenin Thin Solid Films 162 1988 129
20. J.S. Yoon, C.V. Deshpandey, and R.F. Bunshah Thin Solid Films 220 1992 80
21. J.N. Chiang, and D.W. Hess J. Electrochem. Soc. 137 7 1990 2222
22. S. Hasegawa, L. He, Y. Amano, and T. Inokuma Phys. Rev. B 48 8 1993 5315
23. H.J. Stein, S.T. Picraux, and P.H. Holloway IEEE Trans. Electron Devices 25 1978 1008
24. T.P. Smirnova, V.I. Belyi, and L.V. Chramova Thin Solid Films 74 1980 287
25. H.J. Stein, and H.A.R. Wegner J. Electrochem. Soc. 124 1977 908
26. W.J. Kapoor, R.S. Bailey, and H.J. Stein J. Vac. Sci. Technol. A 1 1982 600
27. R.K. Pandey, L.S. Patil, J.P. Bange, D.R. Patil, A.M. Mahajan, D.S. Patil, and D.K. Gautam Opt. Mater. 25 2004 1
28. R.K. Pandey, L.S. Patil, J.P. Bange, and D.K. Gautam Opt. Mater. 27 2004 139
29. R.F. Voss, and J. Clarke Phys. Rev. B 13 1976 556
30. J.L. Bredas T.A. Skotheim Handbook of Conducting Polymers vol. 2 1986 Marcel Dekker New York 859
31. W.-S. Liao, and S.-C. Lee J. Electrochem. Soc. 144 4 1997 1477
32. C.W. Pearce, R.F. Fetcho, M.D. Gross, R.F. Koefer, and R.A. Pudliner J. Appl. Phys. 71 4 1992 1838
33. A.J. Flewitt, A.P. Dyson, J. Robertson, and W.I. Milne Thin Solid Films 383 2001 172
34. G. Lucovsky, P.D. Richard, D.V. Tsu, S.Y. Lin, and R.J. Markunas J. Vac. Sci. Technol. A 4 1986 681
35. M. Modreanu, N. Tomozeiu, P. Cosmin, and M. Gartner Thin Solid Films 337 1999 82
36. M.I. Alayo, I. Pereyra, W.L. Scopel, and M.C.A. Fantini Thin Solid Films 402 2002 154
37. E.A. Taft J. Electrochem. Soc. 118 1971 1341
38. G.N. Parsons, and G. Lucovsky Phys. Rev. B 41 1990 1664
39. G.N. Parsons, J.H. Souk, and J. Batey J. Appl. Phys. 70 3 1991 1553
40. M. Molinari, H. Rinnert, and M. Vergnat Appl. Phys. Lett. 77 2000 3499
41. H.J. Stein, P.S. Peercy, and R.J. Sokel Thin Solid Films 101 1983 291
42. D.E. Kotecki, and J.D. Chapple-Sokol J. Appl. Phys. 77 3 1995 1284
43. C.W. Pearce, R.F. Fetcho, M.D. Gross, R.F. Koefer, and R.A. Pudliner J. Appl. Phys. 71 1992 1838
44. A.R. Reinberg J. Electron. Mater. 8 1979 345