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Volumn 515, Issue 7-8, 2007, Pages 3559-3562
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Comparative analysis of amorphous silicon and silicon nitride multilayer by spectroscopic ellipsometry and transmission electron microscopy
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Author keywords
Amorphous material; Ellipsometry; Optical properties; Silicon nitride
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Indexed keywords
AMORPHOUS SILICON;
ELLIPSOMETRY;
REFRACTIVE INDEX;
SILICON NITRIDE;
SILICON WAFERS;
TRANSMISSION ELECTRON MICROSCOPY;
FREQUENCY SPUTTERING;
MULTILAYER STACKS;
SPECTROSCOPIC ELLIPSOMETRY;
TAUC-LORENTZ OSCILLATOR MODEL;
MULTILAYERS;
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EID: 33846965591
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/j.tsf.2006.10.137 Document Type: Article |
Times cited : (24)
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References (17)
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