Correlation between the composition, structure and properties of dual ion beam deposited SiNx films

Thin Solid Films

Volumn 424, Issue 1, 2003, Pages 143-147

  Tsang, M P ^a   Ong, C W ^a   Choy, C L ^a   Lim, P K ^b   Hung, W W ^b  

^a HONG KONG POLYTECHNIC UNIVERSITY   (Hong Kong)

^b HONG KONG BAPTIST UNIVERSITY   (Hong Kong)

Author keywords

Hardness; Optical band gap; Silicon nitride

Indexed keywords

CHARGE CARRIERS; CHEMICAL VAPOR DEPOSITION; COMPOSITION; COMPRESSIVE STRESS; ELASTIC MODULI; ELECTRIC CONDUCTIVITY; ION BEAMS; ION BOMBARDMENT; SILICON NITRIDE;

OPTICAL BAND GAPS;

THIN FILMS;

EID: 0037460349     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(02)00916-1     Document Type: Conference Paper

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