Investigation of SiO 2 /Si 3 N 4 films prepared on sapphire by r.f. magnetron reactive sputtering

Applied Surface Science

Volumn 252, Issue 12, 2006, Pages 4064-4070

  Feng, Liping ^a   Liu, Zhengtang ^a   Li, Qiang ^a   Song, Wenyan ^a  

^a NORTHWESTERN POLYTECHNICAL UNIVERSITY   (China)

Author keywords

Flexural strength; Magnetron sputtering; Sapphire; SiO 2 Si 3 N 4 films; Transmission

Indexed keywords

BENDING STRENGTH; INFRARED TRANSMISSION; MAGNETRON SPUTTERING; SAPPHIRE; SURFACE ROUGHNESS; THIN FILMS; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

INFRARED WINDOWS; TALYSURF; TRANSMISSION;

SILICON COMPOUNDS;

EID: 33646195197     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2005.06.021     Document Type: Article

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