-
1
-
-
84893997437
-
Silicon nitride thin films by low voltage reactive ion plating: Optical properties and composition
-
B. G. Bovard, J. Ramm, R. Hora, and F. Hanselmann, “Silicon nitride thin films by low voltage reactive ion plating: optical properties and composition, ” Appl. Opt. 28, 4426-4421 (1980).
-
(1980)
Appl. Opt.
, vol.28
, pp. 4421-4426
-
-
Bovard, B.G.1
Ramm, J.2
Hora, R.3
Hanselmann, F.4
-
2
-
-
0027677463
-
Amorphous silicon and amorphous silicon nitride films prepared by plasma-enhanced chemical vapor deposition process as optical coating materials
-
R. Y. Tsai, L. C. Kuo, and F. C. Ho, “Amorphous silicon and amorphous silicon nitride films prepared by plasma-enhanced chemical vapor deposition process as optical coating materials, ” Appl. Opt. 32, 5561-5566 (1993).
-
(1993)
Appl. Opt.
, vol.32
, pp. 5561-5566
-
-
Tsai, R.Y.1
Kuo, L.C.2
Ho, F.C.3
-
3
-
-
0043027076
-
Silicon/ silicon oxide and silicon/silicon nitride multilayers for extreme ultraviolet optical applications
-
P. Boher, P. Houdy, L. Hennet, and D. J. Smith, “Silicon/ silicon oxide and silicon/silicon nitride multilayers for extreme ultraviolet optical applications, ” Opt. Eng. 30, 1049-1061 (1991).
-
(1991)
Opt. Eng.
, vol.30
, pp. 1049-1061
-
-
Boher, P.1
Houdy, P.2
Hennet, L.3
Smith, D.J.4
-
4
-
-
0011953439
-
Optical properties of plasma-enhanced chemical vapor deposition silicon oxynitride films
-
Y. Cros and J. C. Rostaing, “Optical properties of plasma-enhanced chemical vapor deposition silicon oxynitride films, ” J. Appl. Phys. 62, 4536-4544 (1987).
-
(1987)
J. Appl. Phys.
, vol.62
, pp. 4536-4544
-
-
Cros, Y.1
Rostaing, J.C.2
-
5
-
-
0028513982
-
Optical properties of SiNx deposition by electron cyclotron resonance plasma enhanced deposition
-
x deposition by electron cyclotron resonance plasma enhanced deposition, ” Opt. Eng. 33, 2894-2897 (1994).
-
(1994)
Opt. Eng.
, vol.33
, pp. 2894-2897
-
-
Bulkin, P.V.1
Swart, P.L.2
Lacquet, B.M.3
-
6
-
-
0028419807
-
Electron cyclotron resonance plasma deposition of SiN* for optical applications
-
P. V. Bulkin, P. L. Swart, and B. M. Lacquet, “Electron cyclotron resonance plasma deposition of SiN* for optical applications, ” Thin Solid Films 241, 247-250 (1994).
-
(1994)
Thin Solid Films
, vol.241
, pp. 247-250
-
-
Bulkin, P.V.1
Swart, P.L.2
Lacquet, B.M.3
-
7
-
-
0028422549
-
Optical characteristics of amorphous silicon nitride thin films prepared by electron cyclotron resonance plasma chemical vapor deposition
-
T. Inukai and K. Ono, “Optical characteristics of amorphous silicon nitride thin films prepared by electron cyclotron resonance plasma chemical vapor deposition, ” Jpn. J. Appl. Phys. 33, 2593-2598 (1994).
-
(1994)
Jpn. J. Appl. Phys.
, vol.33
, pp. 2593-2598
-
-
Inukai, T.1
Ono, K.2
-
8
-
-
84975645786
-
Synthesis of silicon nitride and silicon oxide films by ion-assisted deposition
-
R. P. Netterfield, R. J. Martin, and W. G. Sainty, “Synthesis of silicon nitride and silicon oxide films by ion-assisted deposition, ” Appl. Opt. 25, 3808-3809 (1986).
-
(1986)
Appl. Opt.
, vol.25
, pp. 3808-3809
-
-
Netterfield, R.P.1
Martin, R.J.2
Sainty, W.G.3
-
9
-
-
0029371062
-
Optical and structural properties of SiO and SiN* materials
-
E. Dehan, P. Temple-Boyer, R. Henda, J. J. Pedroviejo, and E. Scheid, “Optical and structural properties of SiO and SiN* materials, ” Thin Solid Films 266, 14-19 (1994).
-
(1994)
Thin Solid Films
, vol.266
, pp. 14-19
-
-
Dehan, E.1
Temple-Boyer, P.2
Henda, R.3
Pedroviejo, J.J.4
Scheid, E.5
-
10
-
-
0020940620
-
Determination of the thickness and optical constants of amorphous silicon
-
R. Swanepoel, “Determination of the thickness and optical constants of amorphous silicon, ” J. Phys. E 16, 1214-1222 (1983).
-
(1983)
J. Phys. E
, vol.16
, pp. 1214-1222
-
-
Swanepoel, R.1
-
12
-
-
0004556106
-
Rugate filter manufacturing by electron cyclotron resonance plasma-enhanced chemical vapor deposition of SiN*
-
P. L. Swart, P. V. Bulkin, and B. M. Lacquet, “Rugate filter manufacturing by electron cyclotron resonance plasma-enhanced chemical vapor deposition of SiN*, ” Opt. Eng. 36, 1214-1219 (1997).
-
(1997)
Opt. Eng.
, vol.36
, pp. 1214-1219
-
-
Swart, P.L.1
Bulkin, P.V.2
Lacquet, B.M.3
-
13
-
-
0030168641
-
Improvement of the homogeneity of optical thin films by ion-assisted deposition
-
C. C. Lee, Y. Y. Liou, and C. C. Jaing, “Improvement of the homogeneity of optical thin films by ion-assisted deposition, ” J. Mod. Opt. 43, 1149-1154 (1996).
-
(1996)
J. Mod. Opt.
, vol.43
, pp. 1149-1154
-
-
Lee, C.C.1
Liou, Y.Y.2
Jaing, C.C.3
-
14
-
-
84894009438
-
Effective medium theory
-
Institute of Physics, Bristol, Section 8.3
-
L. Ward, “Effective medium theory, ” in The Optical Constants of Bulk Materials and Films (Institute of Physics, Bristol, 1992), Section 8.3, p. 246.
-
(1992)
The Optical Constants of Bulk Materials and Films
, pp. 246
-
-
Ward, L.1
-
15
-
-
0026387676
-
Controlled index of refraction silicon oxynitride films characterized by variable angle spectroscopic ellipsometry
-
Y. M. Xiong, P. G. Snyder, and J. A. Woollam, “Controlled index of refraction silicon oxynitride films characterized by variable angle spectroscopic ellipsometry, ” Thin Solid Films 206, 248-253 (1991).
-
(1991)
Thin Solid Films
, vol.206
, pp. 248-253
-
-
Xiong, Y.M.1
Snyder, P.G.2
Woollam, J.A.3
-
16
-
-
0024715808
-
Fundamentals of ion-beam-assisted deposition: Technique and film properties
-
G. K. Hubler, “Fundamentals of ion-beam-assisted deposition: Technique and film properties, ” Mater. Sci. Eng. A 115, 181-192 (1989).
-
(1989)
Mater. Sci. Eng. A
, vol.115
, pp. 181-192
-
-
Hubler, G.K.1
-
17
-
-
84894010191
-
Bandpass filters for communications
-
of 1995 OSA Technical Digest Series (Optical Society of America, Washington, D.C, FA4-1/429-430
-
D. Cushing, “Bandpass filters for communications, ” in Optical Interference Coatings, Vol. 17 of 1995 OSA Technical Digest Series (Optical Society of America, Washington, D.C., 1995), FA4-1/429-430.
-
(1995)
Optical Interference Coatings
, vol.17
-
-
Cushing, D.1
|