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Volumn 200, Issue 12-13, 2006, Pages 4144-4151

Fabrication and surface characterization of pulsed reactive closed-field unbalanced magnetron sputtered amorphous silicon nitride films

(8) Yao, Zh Q a Yang, P a Huang, N a Sun, H a Wan, G J a Leng, Y X a Wang, J a Chen, J Y a

a SOUTHWEST JIAOTONG UNIVERSITY (China)

Author keywords

a SiNx thin films; Closed field unbalanced magnetron sputtering; Optical band gap; Pulsed magnetron sputtering; Pulsed substrate bias; Valence band spectrum

Indexed keywords

AMORPHOUS FILMS; BAND STRUCTURE; CHEMICAL BONDS; COMPOSITION; ELASTIC MODULI; HARDNESS; MAGNETRON SPUTTERING; MORPHOLOGY; SINGLE CRYSTALS; SPUTTER DEPOSITION; SURFACE PROPERTIES; THIN FILMS;

NANOHARDNESS; OPTICAL BAND GAP; PULSED REACTIVE CLOSED-FIELD UNBALANCED MAGNETRON SPUTTERING; PULSED SUBSTRATE BIAS; VALENCE BAND SPECTRUM;

SILICON NITRIDE;

AMORPHOUS FILMS; BAND STRUCTURE; CHEMICAL BONDS; COMPOSITION; ELASTIC MODULI; HARDNESS; MAGNETRON SPUTTERING; MORPHOLOGY; SILICON NITRIDE; SINGLE CRYSTALS; SPUTTER DEPOSITION; SURFACE PROPERTIES; THIN FILMS;

EID: 32844460456 PISSN: 02578972 EISSN: None Source Type: Journal
DOI: 10.1016/j.surfcoat.2004.12.007 Document Type: Article

Times cited : (22)

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