Behavior of ultrathin [formula omitted] films in very high electric fields: Scanning tunneling microscope-induced void formation and dielectric breakdown

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 19, Issue 4, 2001, Pages 1947-1952

  Niu, C ^a   Magtoto, N P ^a   Kelber, J A ^a  

^a UNIVERSITY OF NORTH TEXAS   (United States)

Author keywords

Al2O3

Indexed keywords

EID: 77952989880     PISSN: 07342101     EISSN: 15208559     Source Type: Journal    
DOI: 10.1116/1.1333088     Document Type: Conference Paper

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