Analysis of breakdown in ferromagnetic tunnel junctions

Journal of Applied Physics

Volumn 86, Issue 7, 1999, Pages 3863-3872

  Oepts, W ^a,b   Verhagen, H J ^a   Coehoorn, R ^b   De Jonge, W J M ^a  

^a EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

^b PHILIPS RESEARCH LABORATORIES   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC BREAKDOWN OF SOLIDS; FERROMAGNETIC MATERIALS; MAGNETIC DEVICES; MAGNETORESISTANCE; MOLECULAR BEAM EPITAXY; PROBABILITY DENSITY FUNCTION; SCANNING ELECTRON MICROSCOPY; SUBSTRATES;

MAGNETIC TUNNEL JUNCTIONS; VOLTAGE DEPENDENT BREAKDOWN PROBABILITY;

TUNNEL JUNCTIONS;

EID: 0032619844     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.371300     Document Type: Article

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