Dependence of tunneling magnetoresistance on cofe interfacial layer thickness in NiFe/Al2O3/NiFe tunnel junctions

IEEE Transactions on Magnetics

Volumn 35, Issue 5 PART 1, 1999, Pages 2919-2921

  Park, B G ^a   Lee D, T ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

Author keywords

CoFe interlayer; Plasma oxidation; Surface roughness; Tunneling junction magnetoresistance

Indexed keywords

ALUMINA; COBALT ALLOYS; MAGNETORESISTANCE; NICKEL ALLOYS; OXIDATION; SURFACE ROUGHNESS; TANTALUM; TUNNEL JUNCTIONS;

TUNNELING MAGNORESISTANCE;

MAGNETIC DEVICES;

EID: 0033184207     PISSN: 00189464     EISSN: None     Source Type: Journal    
DOI: 10.1109/20.801025     Document Type: Article

References (8)

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