Oxygen adsorption and oxide formation on Ni3Al (111)

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 16, Issue 3, 1998, Pages 1000-1005

  Becker, C ^a   Kandler, J ^a   Raaf, H ^a   Linke, R ^a   Pelster, T ^a   Drager M ^a   Tanemura, M ^a,b   Wandelt, K ^a  

^a UNIVERSITY OF BONN   (Germany)

^b NAGOYA INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001202157     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.581221     Document Type: Article

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