Dielectric breakdown of ferromagnetic tunnel junctions

Applied Physics Letters

Volumn 73, Issue 16, 1998, Pages 2363-2365

  Oepts, W ^a   Verhagen, H J ^a   De Jonge, W J M ^a   Coehoorn, R ^b  

^a EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

^b PHILIPS RESEARCH LABORATORIES   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001001946     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.122462     Document Type: Article

References (12)

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9. Our approach leads to a similar equation as the approach leading to Eq. (8) of B. Schlund, J. S. Suehle, C. Messick, and P. Chaparala, IEEE Int. Reliability. Phys. Proc. 34, 84 (1996).
10. R. J. M. van de Veerdonk, J. Nowak, R. Merservey, J. S. Moodera, and W. J. M. de Jonge, Appl. Phys. Lett. 71, 2839 (1997).
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