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Volumn 19, Issue 4, 2006, Pages 521-524

CA resist with side chain PAG group for EUV resist

Author keywords

Chemical amplification resist; EUVL; LER; Outgassing; PAG

Indexed keywords

EID: 33748473997 PISSN: 09149244 EISSN: 13496336 Source Type: Journal
DOI: 10.2494/photopolymer.19.521 Document Type: Article

Times cited : (34)

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