Interfacial properties and characterization of Sc/Si multilayers

Thin Solid Films

Volumn 518, Issue 14, 2010, Pages 3808-3812

  Shendruk, T N ^a   Moewes, A ^a   Kurmaev, E Z ^b   Ochin, P ^c   Maury, H ^d,e   Andre J M ^d,e   Le Guen, K ^d,e   Jonnard, P ^d,e  

^a UNIVERSITY OF SASKATCHEWAN   (Canada)

^b INSTITUTE OF METAL PHYSICS   (Russian Federation)

^c CNRS Université Paris Est Créteil Val de Marne   (France)

^d SORBONNE UNIVERSITÉ   (France)

^e Universit Pierre et Marie Curie Paris 6   (France)

Author keywords

Diffusion barriers; Extreme ultraviolet optics; Intermixing; Multilayers; Scandiumsilicon; X ray absorption spectroscopy; X ray emission spectroscopy

Indexed keywords

BARRIER LAYERS; EXTREME ULTRAVIOLET; EXTREME ULTRAVIOLET OPTICS; INTER-DIFFUSION; INTERFACIAL PROPERTY; MULTI-LAYER SYSTEM; MULTILAYER STRUCTURES; REFLECTIVITY MEASUREMENTS; SCANDIUMSILICON; SHELF LIFE; SOFT X-RAY EMISSIONS; TEMPERATURE RANGE; X RAY EMISSION SPECTROSCOPY;

ABSORPTION; ANNEALING; DIFFUSION BARRIERS; ELECTROMAGNETIC WAVE EMISSION; EMISSION SPECTROSCOPY; ION BEAMS; MULTILAYERS; PHOTODEGRADATION; SCANDIUM; SILICIDES; ULTRAVIOLET DEVICES; X RAY ABSORPTION; X RAY ABSORPTION SPECTROSCOPY; X RAY SCATTERING;

ABSORPTION SPECTROSCOPY;

EID: 77950537711     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2010.01.036     Document Type: Article

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