Non-destructive X-ray study of the interphases in Mo/Si and Mo/B4C/Si/B4C multilayers

Thin Solid Films

Volumn 514, Issue 1-2, 2006, Pages 278-286

  Maury, H ^a   Jonnard, P ^a   Andre J M ^a   Gautier, J ^b   Roulliay, M ^b   Bridou, F ^b   Delmotte, F ^b   Ravet, M F ^b   Jerome A ^b   Holliger, P ^c  

^a SORBONNE UNIVERSITÉ   (France)

^b UNIV PARIS SUD   (France)

^c CEA LETI   (France)

Author keywords

Diffusion; Molybdenum; Multilayer interferential mirrors; Secondary ion mass spectrometry; Silicide; Silicon; X ray emission spectroscopy; X ray reflectivity

Indexed keywords

BORON; DIFFUSION; MAGNETRON SPUTTERING; MOLYBDENUM; REFLECTOMETERS; SECONDARY ION MASS SPECTROMETRY; SILICON; X RAY ANALYSIS;

MULTILAYER INTERFERENTIAL MIRRORS; REFLECTIVITY COEFFICIENT; SILICIDE; X-RAY EMISSION SPECTROSCOPY; X-RAY REFLECTIVITY;

INTERFACES (MATERIALS);

EID: 33745899967     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2006.02.073     Document Type: Article

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