Inter-diffusion effects in as-deposited Al/Ni polycrystalline multi-layers

Surface and Interface Analysis

Volumn 40, Issue 9, 2008, Pages 1318-1321

  Salou, M ^a,b   Rioual, S ^b   Ben Youssef, J ^b   Dekadjevi, D T ^b   Pogossian, S P ^b   Jonnard, P ^c   Le Guen, K ^c   Gamblin, G ^c   Rouvellou, B ^b  

^a UNIVERSITÉ DE BRETAGNE OCCIDENTALE   (France)

^b LaboratoiredeMagnétismedeBretagne   (France)

^c SORBONNE UNIVERSITÉ   (France)

Author keywords

Inter diffusion; Multi layer structure; Nickel aluminium; XES; XPS depth profile; XRD

Indexed keywords

AMORPHOUS MATERIALS; BINARY ALLOYS; DEPTH PROFILING; DIFFUSION; EMISSION SPECTROSCOPY; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY; XENON;

ALUMINIDES; AMORPHOUS PHASE; ATOMIC DIFFUSIONS; COMPLEMENTARY TECHNIQUES; MULTILAYER STRUCTURES; POLYCRYSTALLINE; SPUTTER-DEPTH PROFILING; X RAY EMISSION SPECTROSCOPY;

ALUMINUM ALLOYS;

EID: 52649161717     PISSN: 01422421     EISSN: 10969918     Source Type: Journal    
DOI: 10.1002/sia.2896     Document Type: Article

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