Boron-carbide barrier layers in scandium-silicon multilayers

Thin Solid Films

Volumn 469-470, Issue SPEC. ISS., 2004, Pages 372-376

  Jankowski, A F ^a   Saw, C K ^a   Walton, C C ^a   Hayes, J P ^a   Nilsen, J ^a  

^a LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

Author keywords

Boron carbide; Diffusion barrier; Multilayer; Reflectivity; Scandium silicon

Indexed keywords

ANNEALING; ATOMIC FORCE MICROSCOPY; BORON CARBIDE; DIFFUSION; LASER BEAM EFFECTS; LIGHT ABSORPTION; LITHOGRAPHY; MICROSTRUCTURE; REFLECTION; REFRACTORY MATERIALS; SCANDIUM COMPOUNDS; SEMICONDUCTOR GROWTH; SPUTTER DEPOSITION; THERMODYNAMIC STABILITY; X RAY DIFFRACTION ANALYSIS;

DIFFUSION BARRIERS; EXTREME-ULTRAVIOLET (EUV) LITHOGRAPHY; LASER-DRIVEN X-RAY LASER (XRL) BEAMS; METASTABILITY;

MULTILAYERS;

EID: 10044249951     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.08.153     Document Type: Article

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