Characterization and optimization of magnetron sputtered Sc/Si multilayers for extreme ultraviolet optics

Applied Physics A: Materials Science and Processing

Volumn 88, Issue 4, 2007, Pages 719-725

  Gautier, J ^a   Delmotte, F ^a   Bridou, F ^a   Ravet, M F ^a   Varniere, F ^a   Roulliay, M ^a   Jerome, A ^a   Vickridge, I ^b  

^a INSTITUT D'OPTIQUE GRADUATE SCHOOL   (France)

^b INSTITUT DES NANOSCIENCES DE PARIS   (France)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; MAGNETRON SPUTTERING; OPTIMIZATION; SCANDIUM; SILICON; ULTRAVIOLET DEVICES;

INCIDENCE ANGLES; ULTRAVIOLET OPTICS;

MULTILAYERS;

EID: 34547286470     PISSN: 09478396     EISSN: 14320630     Source Type: Journal    
DOI: 10.1007/s00339-007-4041-6     Document Type: Article

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