EUV and soft X-ray multilayer optics

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5250, Issue , 2004, Pages 109-118

  Kaiser, Norbert ^a   Yulin, Sergiy ^b   Feigl, Torsten ^b   Bernitzki, Helmut ^b   Lauth, Hans ^b  

^a FRAUNHOFER INSTITUTE FOR APPLIED OPTICS AND PRECISION ENGINEERING   (Germany)

^b JENOPTIK Laser Optik Systeme GmbH   (Germany)

Author keywords

Cr Sc; EUV; Magnetron sputtering; Mo Si; Multilayer mirrors; Optics; Sc Si; Soft X rays

Indexed keywords

ELECTROMAGNETIC WAVE REFLECTION; MAGNETRON SPUTTERING; MIRRORS; MOLYBDENUM; SILICON; ULTRAVIOLET RADIATION; X RAY SPECTROSCOPY;

CR/SC; EUV; MO/SI; MULTILAYER MIRRORS; SC/SI; SOFT X RAYS;

X RAY OPTICS;

EID: 1942473829     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.512502     Document Type: Conference Paper

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