Interface characteristics of Mo/Si and B4C/Mo/Si multilayers using non-destructive X-ray techniques

Surface Science

Volumn 601, Issue 11, 2007, Pages 2315-2322

  Maury, H ^a   Jonnard, P ^a   Andre J M ^a   Gautier, J ^b   Bridou, F ^b   Delmotte, F ^b   Ravet, M F ^b  

^a SORBONNE UNIVERSITÉ   (France)

^b INSTITUT D'OPTIQUE GRADUATE SCHOOL   (France)

Author keywords

Molybdenum; Silicides; Silicon; X ray emission; X ray scattering, diffraction, and reflection

Indexed keywords

INTERFACES (MATERIALS); MOLYBDENUM; NONDESTRUCTIVE EXAMINATION; SILICIDES; SILICON; X RAY DIFFRACTION; X RAY SCATTERING;

INTERFACIAL ZONES; X-RAY EMISSION; X-RAY RANGES; X-RAY REFLECTIVITY;

MULTILAYERS;

EID: 34249059306     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.susc.2007.03.044     Document Type: Article

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